MUT-IOE (Warsaw, Poland)

The Institute of Optoelectronics at MUT is a leading research institution on laser development and application in Poland. The specific areas of research activities in the field include: laser optics and electronics, laser systems, laser-matter interactions, laser ranging and sensing, nanotechnology and biomedicine.
Research highlights

Institute of Optoelectronics (IOE), Military
University of Technology (MUT), Warsaw, Poland


Contact: Henryk Fiedorowicz

High energy physics

Workstation for processing materials and photoionization studies using intense EUV pulses.

Secondary Sources

Development of laser-plasma sources of soft X-rays and extreme ultraviolet (EUV) based on a gas puff target [Phys. Plasmas 27, 073102 (2020); Metrol. Meas. Syst. 27, 701 (2020)]

Plasma Physics

Generation of high-density cold plasmas by phtoionization of gases with intense EUV pulses [Laser Part. Beams 37, 400 (2019); J. Phys. B: At. Mol. Opt. Phys. 53, 045701 (2020)].

Cellular and Molecular Biology

Soft X-ray nanoimaging of cell structures and surface modification of biomaterials with EUV to enhance cell adhesion [Appl. Sci. 10, 6895 (2020); Int. J. Mol. Sci. 21, 9679 (2020)]

Imaging & Diagnostic Techniques

Development of new techniques for nanoimaging and spectroscopy studies [Scientific Reports 8, 8494 (2018); Appl. Phys. B 125, 70 (2019); Radiat. Phys. Chem. 175, 108086 (2020)].

Further application highlights

3D Biomedical Imaging



The MUT-IOE laser infrastructure participating in the Laserlab-Europe project is the Laser-Matter Interaction (LMI) team ( The LMI team specializes in the development of laser-driven sources of soft X-rays and extreme ultraviolet (EUV) and applications in science and technology. The sources are based on a gas puff target irradiated with nanosecond laser pulses from commercially available Nd:YAG laser systems. The gas puff target approach allows for the emission of soft X-rays and EUV with high efficiency, comparable to that of solid targets, however, without target debris production.

The LMI team has developed several experimental setups and workstations based on laser plasma soft X-ray and EUV sources with a laser-irradiated gas puff target. The setups and workstations have been applied in various fields, including soft X-ray and EUV microscopy and tomography, soft X-ray absorption spectroscopy (NEXAFS and EXAFS), processing materials with EUV photons, soft X-ray and EUV radiation damage, modification of biomaterials, EUV photoionized plasma studies, metrology of soft X-ray and EUV optical elements and detectors, and others.  The experimental setups and workstations are available for the external users and joint projects partners.

EUV microscope with a 48 nm spatial resolution.Laser plasma produced as a result of irradiation of a gas puff target with nanosecond laser pulses.Experimental setup for X-ray absorption fine structure (XAFS) spectroscopy with a compact laser  plasma soft X-ray source.