2-D nanometer thickness mapping applying a reduced bias soft X-ray NEXAFS approach

Wachulak, P; Fok, T; Janulewicz, K; Kostecki, J; Bartnik, A; Fiedorowicz, L; Fiedorowicz, H
Opt. Express 28, 22478-22489
2020
Peer reviewed publication
https://doi.org/10.1364/OE.397808
yes
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