2-D nanometer thickness mapping applying a reduced bias soft X-ray NEXAFS approach Authors Wachulak, P; Fok, T; Janulewicz, K; Kostecki, J; Bartnik, A; Fiedorowicz, L; Fiedorowicz, H Reference (journal-name volume, pages) Please enter the reference of the journal in the following format: journal-name volume, pages Opt. Express 28, 22478-22489 Year 2020 Publication type Peer reviewed publication DOI https://doi.org/10.1364/OE.397808 Open Access yes URL Project ID Contents There are currently no items in this folder.