Application of laser plasma sources of soft X-rays and extreme ultraviolet (EUV) in imaging, processing materials and photoionization studies

Fiedorowicz, H., A. Bartnik, P. W. Wachulak, R. Jarocki, J. Kostecki, M. Szczurek, I.U. Ahad, T. Fok, A. Szczurek, Ł. Węgrzyński
Springer Proc. in Physics 169, 369
2015
Article/Section in an edited book or book series
https://doi.org/10.1007/978-3-319-19521-6_48
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