Access Facilities - ULF-FORTH
ULF-FORTH Ultraviolet Laser Facility, Foundation for Research and Technology – Hellas, Heraklion, Crete, Greece
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Access to the multi-disciplinary ULF-FORTH laser research
facilities. >>> ULF-FORTH Homepage |
Contact: Demetrios Anglos Email
>> access projects performed by ULF-FORTH users
The Ultraviolet Laser Facility (ULF-FORTH) is a multi-disciplinary
scientific laboratory dedicated to laser-based science, supporting high
quality basic and technological research. It combines state-of-the-art
experimental facilities -a broad variety of laser sources and
experimental workstations, including materials processing and
diagnostic facilities- with a rich spectrum of research activities and
scientific expertise that provide an intellectual environment, ideal
for fostering new ideas and advancing scientific research.
ULF-FORTH is primarily supported by the General Secretariat for
Research and Technology of the Hellenic Ministry of Development. Thanks
to support from the European Commission, ULF-FORTH has been operating
as a European Research Infrastructure since 1990 and has continuously
until today been offering access opportunities (over 2300 access days
for the past 15 years) to researchers from around Europe, who visit
Heraklion to carry out innovative experimental work.
Active areas of research at ULF-FORTH include: 
- Atomic and Optical Physics
- Molecular Physics and Chemical Dynamics
- Interaction of lasers with materials: fundamentals and applications
- Laser applications in Biomedicine
- Laser techniques in Cultural Heritage
ULF-FORTH offers a rich variety of laser sources and
state-of-the-art experimental workstations, in combination with a wide
spectrum of scientific expertise, ranging from basic scientific
research to technological applications. Researchers visiting the
facility have unique opportunities to pursue innovative experimental
projects in a wide area of fields including atomic and molecular
physics, chemical physics and physical chemistry, biomedicine, polymer
physics, materials science, laser materials micro - and
nano-processing, microelectronics and optoelectronics, non linear and
fiber optics and applications of lasers in biology and medicine.
The infrastructure is organized in three major interacting
installations focusing on (a) tunable laser systems, (b) ultrafast,
high-intensity tabletop laser sources and (c) laser material
processing, biomedical and analytical facilities. Access is provided to
a rich variety of laser sources and state-of-the-art experimental
workstations including:
- Tunable Vis -UV-VUV lasers (dye laser and MOPO systems; 205–1800nm; 5-20ns; 0.2 or 0.04cm^-1 bandwidth) coupled to several experimental workstations for performing experiments in atomic and molecular spectroscopy and chemical dynamics.
- Chemical Imaging workstation: A versatile imaging mass spectrometer for detailed photodissociation and bimolecular collisions studies.
- High-intensity excimer based laser system at 248 nm, with pulse duration at 150fs, 450fs or 5ps leading to focused intensities up to 10^16 W/cm^2 with a background contrast ratio 10^10 at the focus.
- Ti:Sa 50 fs laser system, 2 mJ pulse energy at 1 kHz, synchronized to a second beam (150 mJ/pulse) at 10 Hz.
- Ti:Sa 100 fs laser system, 1 mJ pulse energy at variable repetition rate (1Hz-1kHz), coupled to a parametric oscillatoramplifier.
- Tunable XUV station: coherent XUV source based on Higher Order Harmonic Generation, in the range of 18-110 nm, 10^5-10^9 photons/pulse per harmonic at the user target area.
- VUV-XUV generation station: static or pulsed atomic/molecular beam operating in the 30-300 nm range.
- pump-probe setups: sub-fs resolution pump probe interferometers in the homodyned/heterodyned or imaging
- configuration with one or two color and pulse shaping capabilities.
- Femtosecond and nanosecond laser materials micro and nano-processing workstations.
- Time -resolved emission spectroscopy and microscopy for studies of biological systems and laser-tissue interactions.



